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Indeotec Xprt Equipment & Supplies
7 equipment items found
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Control of the plasma stability. Detection of powder formation. Post-data treatment for better interpretation of optical emission spectra. Compact & ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
This all-new technology sets a new benchmark in the PECVD deposition universe. The INDEOtec team has worked successfully at the development of a really innovative reactor system, which allows the deposition of both sides of a substrate without any need to break the vacuum and without the need of substrate ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
With the OCTOPUS II system generation an inline PVD deposition module is available, which facilitates complete deposition cycles of substrates or wafers (for example, heterojunction devices) in one tool, without additional handling and vacuum breakage. The module has been designed for top and bottom side deposition in one single ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Various substrate pre-treatment and handling modules contribute to the flexibility and versatility of the OCTOPUS cluster tool system. No matter if preferably used for research purposes or for pilot scale test series, the tool can be configured according to the specific ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Optical detection of plasma ignition. High sensitivity to detect plasmas with low emission. Digital Output with adjustable threshold. Analog output of plasma intensity. Standard optic fiber connector for easy ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Direct absorption measurement of SiH4 in the infrared. Measurement in the exhaust or in the reactor of PECVD systems. Steady-state or time-resolved measurements. Determination of the SiH4 consumption efficiency, the SiH4 concentration in the plasma, and more. Compact & flange-mountable. ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Measurement of Si powder particles in the PECVD exhaust. Time-resolved or steady-state measurements. Particularly useful for microcrystalline deposition processes. Designed for harsh environments. Compact & ...