- Home
- Equipment
Refine by
Veeco Xprt Equipment & Supplies
5 equipment items found
Manufactured by:Veeco Instruments Inc. based inPlainview, NEW YORK (USA)
Installed at leading IDM’s and Foundries globally, Veeco’s LSA101 System is the preferred technology for high-volume manufacturing of advanced logic devices from the 40nm to 14nm nodes. Built on Veeco’s customizable Unity Platform™, LSA 101’s scanning technology delivers fundamental advantages in uniformity and low-stress processing. The LSA101 system enables ...
Manufactured by:Veeco Instruments Inc. based inPlainview, NEW YORK (USA)
Veeco’s LSA201 Laser Spike Annealing (LSA) System has the same architecture as the LSA101 but includes a patented micro chamber design which enables full-wafer ambient control in a scanning laser system. The micro chamber is unique in that it does not require the use of a vacuum load-lock. The system is capable of running mixtures of any inert gases including forming gas. The LSA201 targets ...
Manufactured by:Veeco Instruments Inc. based inPlainview, NEW YORK (USA)
The AP200/300 family of lithography systems is built on Veeco’s customizable Unity Platform™, delivering superior overlay, resolution and side wall profile performance and enabling highly-automated and cost- effective manufacturing. These systems are particularly well suited for copper pillar, fan-out, through-silicon via (TSV) and silicon interposer applications. In addition, the ...
Manufactured by:Veeco Instruments Inc. based inPlainview, NEW YORK (USA)
Photomask manufacturing demands the highest levels of particle control while depositing sophisticated multiple-layer film structures. This challenge is met with Veeco’s Nexus IBD-LDD Ion Beam Deposition System. Veeco has successfully served the photomask market since the 1990s, and the years of learning have resulted in today’s state-of-the-art system. The IBD-LDD system is ideal for ...
Manufactured by:Veeco Instruments Inc. based inPlainview, NEW YORK (USA)
Data storage manufacturers can dramatically increase yield of 80Gb/in2 sensors, as well as meet the demands of future TFMH device fabrication with Veeco’s third-generation NEXUS® Ion Beam Deposition (IBD) ...
