Fujikin - Model FCS Series -Flow Control System

Developed to enhance stability and repeatability during etch and deposition, the most critical steps in semiconductor wafer manufacturing, the FCS ® differs dramatically from conventional mass flow controllers (MFC) in its very theory of operation. By developing the FCS ® around non-conventional methods, highly accurate flow control is achieved – accuracy that is impossible to achieve with traditional pressure-based MFC’s. The FCS ® overcomes unstable process variations such as pressure fluctuations (hunting) and crosstalk in gas supply systems and provides an unlimited amount of flow control stability. In addition, the high accuracy of the FCS ® matches the state-of-the-art in semiconductor manufacturing and is therefore one of the FCS ®’s most appealing features. The FCS ® promises the highest level of performance.