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Rf Plasma Generator Equipment & Supplies
15 equipment items found
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Need a highly efficient, compact, easy-to-integrate power source? The PDX® series provides extremely accurate, highly repeatable process control, helping to ensure process uniformity and high throughput. It’s wide frequency range of operation delivers optimal control across numerous applications. The PDX low-power (LP) series is available in 1250 W and 1400 W versions and the PDX ...
Manufactured by:T&C Power Conversion, Inc. based inRochester, NEW YORK (USA)
100 W to 2400 W. 13.56 MHz. Analog/Digital, RS-232, USB interfaces. Low Harmonic Distortion. Automatic and Manual Gain Control. High Speed Pulsing (Bursting) controls. Compatible with T&C's Matching Networks. GUI Software (complete PC control). Includes all essential RF power/communication cables and mounting brackets. Air cooled (Air & Water 1200 W +). Half rack mount or stand alone ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
A Compact, Economical, Easy to Install, Low Power RF Platform. Compact, lightweight, and air-cooled HiLight™ RF generators are ideal for low-power, on-board applications, suiting 13.56 MHz plasma and 1 or 2 MHz ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Advance your process development with a new focus on operating flexibility. Paramount® RF generators offer wide frequency and power ranges, support multiple integration scenarios, and are equipped with standard serial or analog interfaces. The Paramount platform’s digital architecture provides precise power management and streamlines new function ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Get the broadest feature set available in a pulsed-RF product. The Paramount Plus offers precise RF regulation, sophisticated pulse manipulation, and advanced data acquisition. Designed to cover an extensive range of RF energy — frequencies of 400 kHz to 60 MHz and power levels of 1.5 to 15 kW — the Paramount Plus delivers the repeatability and reliability you ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
High-Power Density for Compact Installation. When space is limited, but performance is critical, streamlined APEX RF generators offer various mounting options and power you can rely ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Unparalleled Breadth of RF-Application Delivery without Custom Lead Times. Robust and versatile, the Cesar platform provides excellent RF power delivery across a wide range of frequencies and power ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
The versatile, variable-frequency LFGS generator (1250 W, 40 to 500 kHz) suits a wide variety of semiconductor and general plasma-processing applications, including sputtering, reactive ion etching, plasma deposition, polymerization, and surface treatment. Its compact 19", rack-mountable, air-cooled package eases installation and saves ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Asymmetric Bias Waveform Generator for Direct Control of Substrate Voltage and Ion Energy. Advanced Energy’s eVoS platform is a revolutionary power technology for the direct control of ion energy distribution in plasma processing. The integrated, single-enclosure system delivers a customized width and precise control of ion energy for node etch and ...
Manufactured by:Advanced Energy Industries, Inc. based inDenver, COLORADO (USA)
Advanced Energy's Paramount HFi is a 13.56 MHz RF power delivery system with an integrated solid-state matching network capable of operating across a wide variety of impedance zones. The solution offers consistent power delivery, high power density, and exceptional ...
by:FirstNano Brand of CVD Equipment Corporation based inCentral Islip, NEW YORK (USA)
The EasyTube® 3000EXT model has an extended frame size to accommodate the larger system modules. These can include a glovebox, loadlock, a rolling furnace for rapid heating and cooling, an upstream RF plasma generator, and/or an option to increase the process chamber ID up to 200 mm to accommodate full 6” ...
Manufactured by:PerkinElmer, Inc. based inShelton, CONNECTICUT (USA)
The NexION® 350X ICP-MS, with a single-channel Universal Cell, is well suited for general purpose applications that may be susceptible to interferences or analyses where you simply want to remove any unknown interferences. The NexION 350X ICP-MS can use a simple non-reactive gas in Collision mode or a reactive gas in Reaction mode, making it ideal for semi-quantitative analysis, environmental ...
Manufactured by:PIE Scientific LLC based inUnion City, CALIFORNIA (USA)
The only difference between Tergeo-plus and Tergeo plasma cleaner is the size of the sample chamber and rf power. The inner diameter of the sample chamber has been increased from 4.3″/110mm in Tergeo to 6.3″/160mm in Tergeo-plus. The depth of the sample chamber is the same, e.g. ...
by:FirstNano Brand of CVD Equipment Corporation based inCentral Islip, NEW YORK (USA)
The EasyTube® 3000 advanced CVD system is our best-selling and most capable product for university labs and industry R&D facilities. The base system includes a cylindrical quartz process tube which can be from 70 mm to 130 mm ID depending on the desired substrate size. A range of optional modules can be configured to meet the specific requirements of the end user. Many of the options are ...
Manufactured by:PIE Scientific LLC based inUnion City, CALIFORNIA (USA)
Automatic tabletop plasma cleaner for research laboratories and low volume ...