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RENA Technologies GmbH
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  5. InClean / InOxSideClean

InClean / InOxSideClean

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Together with Merck’s etching paste, the InClean offers a smart Selective Emitter upgrade for your solar cell line. After formation of the Selective Emitter structure, the InClean removes the etching paste from the wafer surface. The RENA tool is specially designed for Merck’s isishape and ensures a perfect match between paste, process and equipment platform. The InClean is available as stand-alone tool or for integration into an existing InOxSide tool.

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Features and benefits

  • Merck developed the screen-printable paste isishape SmartEtch™ 1000 for smart single-doping selective emitter processes
  • A proven absolute efficiency gain of 0.5 % is achievable - with potential for more
  • A simple upgrade of your existing cell production line can enhance your profitability and competitiveness
  • Our innovative etchback concept works on both mono- and multi-crystalline wafers and is HF/HNO3 free
  • isishape materials are qualified for mass production
  • The isishape working principle consists of 3 simple steps and performs excellently for selective emitter as well as other modern solar cell concepts, e.g. LBSF, MWT, IBC ...