Plasma Characterisation - semiconductor industry

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry. Plasma diagnostics for applications in etching, deposition, coating and surface modification. ECR – Electron Cyclotron Resonance plasma Magnetron sputtering High power impulse magnetron sputtering, HIPIMS ICP inductively coupled plasma, and RF plasma Dielectric-barrier discharge (DBD)