Spectral Data Analysis Articles & Analysis
6 articles found
As semiconductor devices shrink to meet the demands of advanced electronics, the precision of material removal during fabrication becomes increasingly important. Processes like ion beam etching must stop precisely at targeted etch depths to preserve layer integrity and device function. In multi-layered device architectures, even minor deviations in etch depth can compromise performance or yield. ...
This step is crucial to prevent further exchange during subsequent analysis. Mass Spectrometry Analysis: The quenched samples are subjected to intact or peptide-level mass spectrometry analysis. ...
The implementation of this method has previously shown to be difficult because of the very small levels of dispersion observed in seismic data. Our approach aims to overcome the problem by applying a multi-channel spectral analysis which is widely used in surface wave testing to calculate a velocity dispersion. ...
The implementation of this method has previously shown to be difficult because of the very small levels of dispersion observed in seismic data. Our approach aims to overcome the problem by applying a multi-channel spectral analysis which is widely used in surface wave testing to calculate a velocity dispersion. ...
The CPSC test method specifies solvent extraction and subsequent GCMS analysis for specific phthalate esters. In this study, analysis by pyrolysis GCMS was investigated as a technique to simplify sample preparation and improve analytical precision. The CPSC test method also specifies GCMS analysis in the SIM mode to monitor for low-intensity ...
However, this technique suffers if the baseline is not accurately known, and it fails completely in those cases where an individual spectral feature of a sample is below the noise level. These problems can be reduced if the proper least square fitting routines are applied to the data. ...