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Semilab - Model AFM-2200 -Atomic Force Microscope
Semilab Atomic Force Microscopes provide high-resolution, sub-atomic precise measurements with extremely low noise level which enables consistent and highly reproducible roughness characterization for the quality control of Si and compound wafers. The Semilab AFM-2200 offers highly reproducible roughness characterization for the quality control of up to 12” semiconductor wafers for those seeking atomic force microscopy with an automated sample loading system.
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The Semilab AFM-2200 system is designed for various applications, including:
- CMP Process Control:
- Analysis of micro-roughness and lateral surface structures
- Automated Defect Review:
- Defect detection by light-scattering method (μPIT) and characterization using AFM
- Device Characterization:
- Critical Dimension measurements, failure analysis
- AFM Tip Scanner, utilizing flexure-guided piezo positioners for flat scanner movement
- Fully automated AFM with automatic simple loadport
- Automatic tip exchange and laser alignment
- Sub-atomic resolution
- Maximum scan area size can be configured according to industry requirements
- Full 12 inch wafer is accessible by the AFM scanner
- KLARF file import & export
- Profilometer mode
- Optional Advanced Defect Review and Pattern Recognition

