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Cn1 Xprt Equipment & Supplies
4 equipment items found
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
CN1 supplies various types of canister which contains liquid chemicals for ALD- and CVD-related processes in semiconductor-based ...
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
Substrate Size : 4 ~ 8” Standard (Wafer). Thermal ALD Process. Laminar Gas Flow (Side Gas Flow). Gas Delivery System : Bubbler, LDS etc. Low Particle Generation. Small Volume for Process. Available Laminated & Mixed Process. Easy User Interface & Maintenance. Max Temperature : 450 ? (@ Wafer). No. of Precursor Canisters : Up to 4 Sets ...
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
Substrate Size : 4 ~ 12” Standard (Wafer). Thermal ALD Process (Plasma Process Available). Gap Adjustable between Showerhead and Substrate. Gas Delivery System : Bubbler, LDS etc. Max Temperature : 500 ? (@ Wafer). No. of Precursor Canisters : Up to 4 Sets (Standard). Pressure Control : Automatic Control by Throttle Valve. Process Gauge : CDG Gauge (10 Torr). Process Pump : Dry Pump (Rotary ...
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
Reactor Volume : 100 cc ~ 500 cc. Filter Size : Variable (0.5 µm~ ). Reactor Heating : Max 300 ? (Reactor Body : more than 230 ?). Reactor rotation : DC Motor Driver. Rotation speed : 10 ~ 60 ...