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Substrate Handling Equipment & Supplies
35 equipment items found
Manufactured by:Javo BV based inNoordwijkerhout, NETHERLANDS
The Javo Big Filler offers a lot of flexibility wherever substrate needs to be elevated and distributed evenly and exactly. The standard mobile design is suitable for virtually all different kinds of ...
Manufactured by:Javo BV based inNoordwijkerhout, NETHERLANDS
An electrically driven tilting system, suitable for a smooth tilting of substrate from a big bale. Its automatic dispensing system delivers the substrate efficiently and worry-free. This machine is suitable for all standard big ...
Manufactured by:AGC Plasma Technology Solutions based inLauenförde, GERMANY
AGC Plasma's expertise in innovating high vacuum coating systems leads to customized solutions tailored specifically for specialized applications. This process may entail the development of customized vacuum chambers, deposition sources, and substrate handling mechanisms meticulously optimized to suit your unique requirements. We specialize in translating your ...
Manufactured by:Forge Nano based inThornton, COLORADO (USA)
Designed for high volume semiconductor wafer-based production, our Semi-S2 certified Apollo systems integrate the high productivity of SMFD-ALD with a revolutionary simple substrate handling. The result is a flexible, modular system that can be easily configured to our customers’ ...
Manufactured by:Plasma-Therm based inSaint Petersburg, ALABAMA (USA)
The VERSALINE platform from Plasma-Therm is engineered to support a broad spectrum of applications within the specialty semiconductor markets, primarily focusing on etching and deposition processes. With its modular design, VERSALINE allows for flexible substrate handling configurations, making it suitable for both research and development and high-volume ...
by:SparkNano based inEindhoven, NETHERLANDS
Vellum is tailored designed for sheet to sheet (S2S) applications for deposition on substrates ranging from 0,5 x 0,5m up to 1 x 1.5 m. Substrates like metal or polymer foils, wafers, glass and porous substrates. All aimed at real production throughput up to 20 substrates per minute. In combination with a large variety of ...
Manufactured by:Meyer Burger based inGwatt (Thun), SWITZERLAND
The affordable IonSys 500 system is used for ion beam etching in research and development as well as in low volume production. The machine can be loaded manually or via a single-substrate load-lock. The handling can be configured for standard wafers or for standardized carriers for processing different sample ...
Manufactured by:Indeotec SA based inNeuchâtel, SWITZERLAND
Various substrate pre-treatment and handling modules contribute to the flexibility and versatility of the OCTOPUS cluster tool system. No matter if preferably used for research purposes or for pilot scale test series, the tool can be configured according to the specific ...
Manufactured by:Schmack Biogas GmbH - member of the Viessmann Group based inSchwandorf, GERMANY
Flexible supply system – even for difficult substrates. The PASCO 8/12 supply system is a robust dosing station made of steel. The PASCO 8/12 is specially designed to handle difficult substrates, such as larger quantities of solid manure, grass and other regenerative raw materials. The basic version of the PASCO has a capacity of approx. 8 ...
Manufactured by:Dunmore Corporation based inBristol, PENNSYLVANIA (USA)
DUNMORE digital print-receptive products contain a proprietary DUN-DIGITAL Indigo coating designed to meet the needs of the HP Indigo Press. DUNMORE's coating has been Three Star Certified by Rochester Institute of Technology (RIT), the highest certification rating for Indigo printing. The coating is transparent and is available on several base films including clear and white polyester film, ...
Manufactured by:Forge Nano based inThornton, COLORADO (USA)
We created Prometheus to enable atomic layer deposition research. Research and development for ALD has never been easier. Our tools put ALD at your fingertips. Forge Nano has installed Prometheus in laboratories and universities all over the ...
Manufactured by:Jemmco, LLC based inMequon, WISCONSIN (USA)
The JemmTrac Traction Sleeve by Jemmco offers an innovative solution for enhancing the performance of roller systems. Designed for web handling, extrusion, and laminating applications, these sleeves provide a unique tacky surface that ensures rolls remain operational without marking or damaging substrates. Eliminating the need for adhesive tapes and cork, ...
Manufactured by:AJA International, Inc. based inHingham, MASSACHUSETTS (USA)
These systems feature cylindrical chambers with large hinged doors for easy access and maintenance. A key feature is the substrate holder, capable of handling up to 4-inch wafers with capabilities such as azimuthal rotation, motorized tilt adjustment, and cooling options using H2O, LN2, and backside gas cooling. The system incorporates sputter sources for ...
Manufactured by:Brooks Automation based inChelmsford, MASSACHUSETTS (USA)
The Marathon LEAP™ AX is a revolutionary wafer transfer platform that addresses customers' current and future needs for atmospheric systems. Brooks understands the challenges customers face in responding to rapidly changing requirements and business conditions, and the Marathon LEAP AX offers unique value and capabilities to meet their demanding technical and operational ...
Manufactured by:Denton Vacuum, LLC based inMoorestown, NEW JERSEY (USA)
The production-proven Discovery platform can handle substrates up to 300mm. The cluster configuration makes it suitable for multi-layer, oxygen-sensitive applications and high throughput requirements. The platform accommodates DC, pulsed DC, and RF sputtering, which feature the single-cathode configuration for high uniformity, as well as confocal co-sputtering ...
Manufactured by:FHR Anlagenbau GmbH based inOttendorf-Okrilla, GERMANY
Industrial manufacturing lines, highly productive pilot lines or research and development systems: Uni- or bi-directional (oscillating) substrate transport; Simultaneous coating of the front and back possible; Various process technologies can be integrated; Vertical and horizontal designs are ...
Manufactured by:Advantest America,Inc. based inSan Jose, CALIFORNIA (USA)
Low-Cost, High Throughput EB Lithography Tool Supports Ultrafine Pattern Fabrication for Diverse Substrates. The F5113 is an electron-beam lithography system supporting 200mm and 3-inch through to 6-inch substrates, making it an optimal tool for processing advanced LSIs, compound semiconductor wafers, magnetic heads, smart power devices, photonics devices, MEMS, and other devices requiring ...
Manufactured by:Gamma Scientific based inSan Diego, CALIFORNIA (USA)
The GS-191-FA-1045 Rotary Reflectance Measurement System by Gamma Scientific is a fully automated gonio-reflectance measurement instrument designed for high precision capture of spectral and colorimetric properties at 0° and 45° angles of incidence. It is optimized for analyzing coated glass, polished substrates, or diffuse surfaces without the need for second-surface ...
Manufactured by:ITW Dynatec Americas based inHendersonville, TENNESSEE (USA)
ITW Dynatec’s APEX High Speed Slot Die Applicator is an air-operated hot melt adhesive applicator assembly with an optional filter manifold. The applicator is used with intermittent pressure and constant pressure hot melt adhesive supply units (ASUs). APEX models are offered in six different module configurations. Each APEX High Speed Slot Die applicator features various combinations of ...
Manufactured by:Singulus Technologies AG based inKahl, GERMANY
Selenisation furnace for an optimized CIGS absorber formation.The CISARIS selenisation furnace is an inline rapid thermal processing equipment, designed for the CIGS absorber formation on large area glass substrates. CISARIS consists of a handling station, a vacuum tight process section, and a return conveyor and is optimized for the mass production of CIS solar ...