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  • envea
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  • ertelalsop double o-ring pak
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  • zetadri-pak
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  • Air pollution, emission and process monitoring systems for metals
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Stack Filter Equipment Supplied In Denmark

17 equipment items found
In DenmarkAvailable In DenmarkNear Denmark

ErtelAlsop Double O-Ring Pak - Stacked Disc Filter System

ErtelAlsop Double O-Ring Pak - Stacked Disc Filter System

Manufactured by:ErtelAlsop   based inKingston, NEW YORK (USA)
The ErtelAlsop Double O-Ring Pak System consists of our Pharma-Pak highly polished stainless steel double o-ring housing used in conjunction with our Bio-Pak double o-ring lenticular cartridge. Current flat gasket cartridge technology can present difficulties with sealing between gaskets, the misalignment of cartridges and the dynamic tension system necessary to seal cartridges. The simple ...
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Pak - Stacked Disc Depth Filter Cartridges

Pak - Stacked Disc Depth Filter Cartridges

Manufactured by:ErtelAlsop   based inKingston, NEW YORK (USA)
In 1942 one of our engineers met with a customer in a parking lot and presented him with the very first stacked disc lenticular filter cartridge, the Disc-Pak. The customer had requested a filtration system, which was enclosed and would allow for a fast change out when the filter became plugged, in order to minimize exposure to the operators. The ...
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ZetaDri-Pak - Lenticular Stacked Disc Cartridge - Filter Module

ZetaDri-Pak - Lenticular Stacked Disc Cartridge - Filter Module

Manufactured by:ErtelAlsop   based inKingston, NEW YORK (USA)
The ZetaDri-Pak is a lenticular disc cartridge that offers the benefits of depth filtration in addition to capturing free and emulsified water from your product. The depth filter Pak cartridge invented by ErtelAlsop more than 50 years ago allows for easy change out, low labor costs, along with optimizing filtration area and cake space. The 16 cell ZetaDri-Pak holds a minimum of 148 ounces of ...
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ENVEA - Model VIEW 273 - ElectroDynamic Dust Monitor
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ENVEA - Model VIEW 273 - ElectroDynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-sensor dust monitor for indicative emissions trending in industrial stacks after bag filters, cartridge filters, cyclones and process driers, where regulatory approvals are not necessary. Advanced Probe Electrification featuring long term data logging for process trend analysis and ...
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Envea - Model View 370 - Electro Dynamic Dust Monitor
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Envea - Model View 370 - Electro Dynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-sensor dust monitor designed for high quality emission measurement in industrial stacks after bag filters, cartridge filters, cyclones and process driers. Advanced Probe Electrification Multi-sensor dust monitor designed for high quality emission measurement in industrial stacks where regulatory approvals are not ...
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Jimco - Model KPC -De Lux - Kitchen Pollution Control Unit
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Jimco - Model KPC -De Lux - Kitchen Pollution Control Unit

Manufactured by:Jimco A/S   based inRudkøbing, DENMARK
One steel frame in 3 lengths, where it is possible to mount from 2 to 8 pcs. of UV-C lamps. Then the elements must be connected to a ballast box which secures that the lamps turn on and off correctly. The ballast box will be connected to the control board ...
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Jimco - Model KPC -B - Kitchen Pollution Control Unit
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Jimco - Model KPC -B - Kitchen Pollution Control Unit

Manufactured by:Jimco A/S   based inRudkøbing, DENMARK
One steel frame in 3 lengths, where it is possible to mount from 2 to 8 pcs. of UV-C lamps. The frame will be connected to the control board (STO). In this model, the ballast is mounted in the ...
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Envea - Model Dust Alarm 40 - Electro Dynamic Bag Filters Failure Detectors
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Envea - Model Dust Alarm 40 - Electro Dynamic Bag Filters Failure Detectors

Manufactured by:ENVEA   based inPoissy, FRANCE
Controller based Gross filter failure detector. Detects significant increases in particulate loading providing warnings of filter media degradation in baghouses and cartridge ...
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ENVEA - Model STACK 181 - PS11 Capable Forward Scatter Particulate CEM
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ENVEA - Model STACK 181 - PS11 Capable Forward Scatter Particulate CEM

Manufactured by:ENVEA   based inPoissy, FRANCE
Utilising the patented ProScatterTM Forward Scatter measurement technique for measuring particulate concentration levels, typically between 0.06 mg/m3 to 300 mg/m3, this measurement technique offers improved levels of performance which make the STACK 181 very suitable for use as a PM CPMS or PM CEMS that need to comply with US EPA PS-11 for Site Operators looking to satisfy the ...
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Envea - Model View 820 - Electro Dynamic Dust Monitor
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Envea - Model View 820 - Electro Dynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Certified Multi-sensor dust monitor – category 1 under ATEX / IECEx – for indicative emissions trending and measurement in hazardous zone and in dry processess with elevated pressures. Advanced Probe Electrification featuring long term data logging for process trend analysis and ...
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Envea - Model Leak Locate 662 - Filter Performance Monitors
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Envea - Model Leak Locate 662 - Filter Performance Monitors

Manufactured by:ENVEA   based inPoissy, FRANCE
The LEAK LOCATE 662 is a digitally networked, multi-compartment baghouse monitoring system providing remote observation of the condition of bag and cartridge ...
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ENVEA - Model STACK 602 - Dynamic opacity Approved Particulate CEM
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ENVEA - Model STACK 602 - Dynamic opacity Approved Particulate CEM

Manufactured by:ENVEA   based inPoissy, FRANCE
TÜV approved DynamicOpacity™ particulate monitor for emission measurement of dust from large dry industrial processes including Baghouses and Electrostatic ...
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Envea - Model View 800 - Electro Dynamic Multi-Sensor Dust Monitor
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Envea - Model View 800 - Electro Dynamic Multi-Sensor Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-Sensor Dust Monitor certified to category 1 under ATEX / IECEx designed for indicative emissions trending and measurement in challenging hazardous zone. Advanced Probe Electrification technology, perfectly adapted for particulate monitoring after bag filters, cartridge filters, cyclones and process driers, where regulatory approvals are not ...
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Envea - Model Stack 980 - Electro Dynamic Approved Particulate CEM Monitoring System
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Envea - Model Stack 980 - Electro Dynamic Approved Particulate CEM Monitoring System

Manufactured by:ENVEA   based inPoissy, FRANCE
MCERTS EN 15859 Filter Dust Approved Particulate monitoring system providing high quality emission measurement for low dust concentrations from dry industrial processes including Baghouses and Cartridge ...
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Envea - Model Leak Locate 320 - Electro Dynamic Multi-Chamber Filter Performance Monitor
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Envea - Model Leak Locate 320 - Electro Dynamic Multi-Chamber Filter Performance Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Controller based filter dust leak monitor (0-100%) for filter emissions monitoring after bag houses, cartridge filters, cyclones ...
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Envea - Model Stack 990 - Electro Dynamic Approved Particulate Monitor
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Envea - Model Stack 990 - Electro Dynamic Approved Particulate Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
TÜV approved particulate monitor providing high quality emission measurement for low dust concentrations from dry industrial processes including Baghouses and Cartridge ...
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Model Titan 2 - Benzene Gas Monitor

Model Titan 2 - Benzene Gas Monitor

Manufactured by:ION Science Ltd.   based inRoyston, UNITED KINGDOM
Monitor and sample benzene with world leading benzene detection technology. Titan 2 benzene gas monitor incorporates the NEW MiniPID T2 10.0 eV Sensor which offers improved sensitivity, reliability and overall performance. The unique sampling method eliminates interfering gases such as toluene, xylene and methane providing you with accurate benzene concentration readings you can rely ...
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