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Atomic Layer Deposition Equipment & Supplies
36 equipment items found
by:Powall based inDelft, NETHERLANDS
ALD deposits ultrathin films with Angstrom level precision allowing the growth of a monolayer on powders. This solvent free process doesn’t require complex evaporation or waste treatment. ALD has superior control over nanocoating thickness, low waste generation and is flexible for a wide range of both coating and powder chemistries. Powall’s nanocoating technology takes the advantages ...
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
Substrate Size : 4 ~ 8” Standard (Wafer). Thermal ALD Process. Laminar Gas Flow (Side Gas Flow). Gas Delivery System : Bubbler, LDS etc. Low Particle Generation. Small Volume for Process. Available Laminated & Mixed Process. Easy User Interface & Maintenance. Max Temperature : 450 ? (@ Wafer). No. of Precursor Canisters : Up to 4 Sets ...
Manufactured by:CN1 based inGyenggi-do, SOUTH KOREA
Substrate Size : 4 ~ 12” Standard (Wafer). Thermal ALD Process (Plasma Process Available). Gap Adjustable between Showerhead and Substrate. Gas Delivery System : Bubbler, LDS etc. Max Temperature : 500 ? (@ Wafer). No. of Precursor Canisters : Up to 4 Sets (Standard). Pressure Control : Automatic Control by Throttle Valve. Process Gauge : CDG Gauge (10 Torr). Process Pump : Dry Pump (Rotary ...
Manufactured by:CVD Equipment Corporation based inCentral Islip, NEW YORK (USA)
ALD is a thin film deposition process that allows for atomic layer thickness resolution, excellent conformity of high aspect ratio surfaces, and pinhole-free layers. This is achieved by sequential formation of atomic layers in a self-limiting ...
Manufactured by:SVT Associates, Inc. based inEden Prairie, MINNESOTA (USA)
SVT Associates' NorthStar™ Atomic Layer Deposition (ALD) system is a versatile research deposition tool for thermal or energy enhanced ALD. With up to 8 precursor lines and a hot wall — cross flow deposition chamber, a wide range of applications may be performed from a single system. Sample ...
Manufactured by:Swagelok Company based inSolon, OHIO (USA)
Swagelok is a global technical leader and solutions provider in semiconductor chip manufacturing applications as well as the originator of ALD valve technology. Our ALD ultrahigh-purity (UHP) valves ...
Manufactured by:Fitok Group based inOffenbach am main, GERMANY
Atomic Layer Deposition (ALD) is a method of applying thin films to various substrates with atomic scale precision. As chip node dimensions are continuously shrinking, traditional deposition techniques have reached their limits. Depositing ultra-thin layer at the nanoscale ...
Manufactured by:Solayer GmbH based inKarlstein, GERMANY
The Atomic Layer Deposition (ALD) tool is a custom-built R2R equipment that offers high layer conformity at high aspect ratios as well as an exact control of the layer thickness. The tool is designed for advanced R&D-processes as well as for processes in an industrial ...
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
The SENTECH SI PEALD system is designed for the homogenous and conformal coating of sensitive substrates and layers, operating efficiently at low temperatures under 100°C. This advanced atomic layer deposition technology ensures precise, conformal, and uniform film deposition, crucial for semiconductor ...
Manufactured by:Forge Nano based inThornton, COLORADO (USA)
We created Prometheus to enable atomic layer deposition research. Research and development for ALD has never been easier. Our tools put ALD at your fingertips. Forge Nano has installed Prometheus in laboratories and universities all over the ...
Manufactured by:Sempa Systems GmbH based inDresden, GERMANY
Thin Film processing on the scale of single atomic layers is gaining growing interest with the increasing demand of modern structures in microelectronics. Multiple patterning with Atomic Layer Deposition ALD, the deposition of high-k films like Al2O3 and Zr/Hf Oxides or 3D structures are key ...
Manufactured by:MSP Corporation based inShoreview, MINNESOTA (USA)
We offer a series of Turbo Vaporizers for liquid source vaporization by direct liquid injection for thin film deposition by Chemical Vaporizer Deposition (CVD), Plasma Enhanced CVD (PECVD), and Atomic Layer Deposition (ALD) processes. Each vaporizer is customized for a specific application to meet the individual ...
Manufactured by:MSP Corporation based inShoreview, MINNESOTA (USA)
We offer a series of Turbo Vaporizers for liquid source vaporization by direct liquid injection for thin film deposition by Chemical Vaporizer Deposition (CVD), Plasma Enhanced CVD (PECVD), and Atomic Layer Deposition (ALD) processes. Each vaporizer is customized for a specific application to meet the individual ...
Manufactured by:Forge Nano based inThornton, COLORADO (USA)
The Apollo system product line sets new benchmarks in atomic layer deposition productivity and cost effectiveness. Designed for high volume semiconductor wafer-based production, our Semi-S2 certified Apollo systems integrate the high productivity of SMFD-ALD with a revolutionary simple substrate handling. ...
Manufactured by:iCAM Engineering based in, UNITED KINGDOM
High integrity precursor delivery containers (Bubblers) for use in Chemical Vapour Deposition (CVD), Metalorganic Chemical Vapour Deposition (MOCVD) and Atomic Layer Deposition (ALD) applications. Containers are an integral part of the supply of high purity chemicals to the electronics industry. Efficient ...
Manufactured by:ACM Research based inFremont, CALIFORNIA (USA)
Part of ACM’s Ultra family of advanced wafer processing systems, the Ultra Furnace platform addresses dry processing challenges of low-pressure chemical vapor deposition (LPCVD), atomic layer deposition (ALD), oxidation and annealing. The Ultra Furnace was designed from the ground up to meet best-in-class requirements. Its ...
by:SparkNano based inEindhoven, NETHERLANDS
Highly reduced use of scarce materials while maintaining excellent performance. The quest for a sustainable planet: At SparkNano, we believe that our Spatial Atomic Layer Deposition (ALD) technology can support the quest for a sustainable planet and the development of better, cheaper and higher-performing materials for the hydrogen, battery, ...
Manufactured by:SENTECH Instruments GmbH based inBerlin, GERMANY
SENTECH Instruments GmbH offers advanced Cluster Configurations for Plasma Etching and Deposition, designed to enhance high yield and throughput for semiconductor processing. These systems combine plasma etch and deposition modules with up to two cassette stations, allowing for consistent, high-volume processing of wafers up to 200mm in diameter. The setup ...
Manufactured by:CLEAN SYSTEMS Technology (S) Pte Ltd. based inSingapore, SINGAPORE
The system utilizes adhesive CLEANSORB granules within a dry bed absorber setup, ensuring safety and efficiency in the treatment of process gases. With its functionality spanning applications like Plasma Etching, Chemical Vapor Deposition (CVD), Atomic Layer Deposition (ALD), Ion Implantation, and CIGS Photovoltaics, it serves ...
Manufactured by:CLEAN SYSTEMS Technology (S) Pte Ltd. based inSingapore, SINGAPORE
Its chemisorber media ensure safety and performance, making it suitable for a variety of specific process applications, such as plasma etching, chemical vapor deposition (CVD), atomic layer deposition (ALD), ion implantation, and photovoltaic production. With its enhanced capabilities, the FABLINE FX upholds environmental ...