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  • Air pollution, emission and process monitoring systems for metals
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Ceramic Filter Equipment Supplied In Denmark

30 equipment items found
In DenmarkAvailable In DenmarkNear Denmark

LiqTech - Model SiC  - Ceramic Membrane Filters

LiqTech - Model SiC - Ceramic Membrane Filters

Manufactured by:LiqTech Holding A/S   based inBallerup, DENMARK
Our SiC filters are manufactured with a ceramic membrane based on our unique, patented silicon carbide membrane technology. We make both the substrate (honeycomb) and the membrane (the part that accomplishes the filtering) solely from the durable and long-lasting material, silicon carbide. This gives our membranes some unique advantages compared ...
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ENVEA - Model STACK 181 - PS11 Capable Forward Scatter Particulate CEM
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ENVEA - Model STACK 181 - PS11 Capable Forward Scatter Particulate CEM

Manufactured by:ENVEA   based inPoissy, FRANCE
US EPA PS11 compliant ProScatter™ particulate CEM providing high quality emission measurement for low dust concentrations from industrial processes. Utilising the patented ProScatterTM Forward Scatter measurement technique for measuring particulate concentration levels, typically between 0.06 mg/m3 to 300 mg/m3, this measurement technique offers improved levels of performance which make the ...
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Envea - Model Leak Alert 75 - Electro Dynamic Filter Dust/Leak Monitor
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Envea - Model Leak Alert 75 - Electro Dynamic Filter Dust/Leak Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Stand alone TÜV approved filter dust leak monitor suited to the monitoring of filter emissions (0-100%) after bag houses, cartridge filters, cyclones ...
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Envea - Model QAL 360 - Back Scatters Particulate CEM System
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Envea - Model QAL 360 - Back Scatters Particulate CEM System

Manufactured by:ENVEA   based inPoissy, FRANCE
TUV QAL1 and MCERTS Approved, Stand alone or networked system option Particulate CEM providing high quality emission measurement for dust concentrations from industrial processes. Having a 0–7.5 mg/m³ certification range, the QAL 360 sensor can be used at low or high dust levels meeting the tightened minimum emission limit value of 5 mg/m³ for Large Combustion Plant specified in ...
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Envea - Model Stack 980 - Electro Dynamic Approved Particulate CEM Monitoring System
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Envea - Model Stack 980 - Electro Dynamic Approved Particulate CEM Monitoring System

Manufactured by:ENVEA   based inPoissy, FRANCE
MCERTS EN 15859 Filter Dust Approved Particulate monitoring system providing high quality emission measurement for low dust concentrations from dry industrial processes including Baghouses and Cartridge ...
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Envea - Model View 370 - Electro Dynamic Dust Monitor
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Envea - Model View 370 - Electro Dynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-sensor dust monitor designed for high quality emission measurement in industrial stacks after bag filters, cartridge filters, cyclones and process driers. Advanced Probe Electrification Multi-sensor dust monitor designed for high quality emission measurement in industrial stacks where regulatory approvals are not ...
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Envea - Model DM 170 - Light Scatter Particulate Emissions Monitor
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Envea - Model DM 170 - Light Scatter Particulate Emissions Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
The DM 170 is designed to comply with the TÜV suitability testing scheme to EN 15267 and for measuring dust concentrations in a wide range of industrial ...
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Envea - Model QAL 260 - Back Scatter Particulate CEM System
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Envea - Model QAL 260 - Back Scatter Particulate CEM System

Manufactured by:ENVEA   based inPoissy, FRANCE
MCERTS QAL1 approved, stand alone or multi-sensor Particulate CEM providing high quality emission measurement for low dust concentrations from dry industrial ...
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Envea - Model Leak Locate 662 - Filter Performance Monitors
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Envea - Model Leak Locate 662 - Filter Performance Monitors

Manufactured by:ENVEA   based inPoissy, FRANCE
The LEAK LOCATE 662 is a digitally networked, multi-compartment baghouse monitoring system providing remote observation of the condition of bag and cartridge ...
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Envea - Model QAL 181-QAL1 - Forward Scatter Particulate CEM System
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Envea - Model QAL 181-QAL1 - Forward Scatter Particulate CEM System

Manufactured by:ENVEA   based inPoissy, FRANCE
QAL1 Approved ProScatter™ particulate CEM providing high quality emission measurement of low dust concentrations from dry industrial processes. 4 QAL1 certified ranges, including 0 – 7.5 mg/m3, the lowest achievable for any PM-CEM. ...
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ENVEA - Model StackFlow 100 - Micro-Venturi Flue Gas Velocity CEM
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ENVEA - Model StackFlow 100 - Micro-Venturi Flue Gas Velocity CEM

Manufactured by:ENVEA   based inPoissy, FRANCE
Flue gas flowmeter for continuous measurement of gas velocity, temperature and pressure in exhaust gas ducts (chimneys or flue pipes). Micro-Venturi technology. The StackFlow 100 is a compact flowmeter for continuous measurement of velocity, temperature and static pressure in exhaust gas ducts ( stacks or flue gas ducts) using the Micro-Venturi technology. From these measurements, StackFlow 100 ...
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ENVEA - Model STACK 181 WS - Particulate CEM for Wet Gas Stream
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ENVEA - Model STACK 181 WS - Particulate CEM for Wet Gas Stream

Manufactured by:ENVEA   based inPoissy, FRANCE
US EPA PS11 capable ProScatter™ particulate CEM for the extractive sampling and measurement of particulate in saturated wet gas ...
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Envea - Model Dust Alarm 40 - Electro Dynamic Bag Filters Failure Detectors
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Envea - Model Dust Alarm 40 - Electro Dynamic Bag Filters Failure Detectors

Manufactured by:ENVEA   based inPoissy, FRANCE
Controller based Gross filter failure detector. Detects significant increases in particulate loading providing warnings of filter media degradation in baghouses and cartridge ...
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Envea - Model Leak Alert 65-02 - Electro Dynamic Filter Dust/Leak Monitor
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Envea - Model Leak Alert 65-02 - Electro Dynamic Filter Dust/Leak Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Controller based filter dust leak monitor for filter emissions monitoring after bag houses, cartridge filters, cyclones etc. where performance approvals are not required. The LEAK ALERT 65-02 is particularly suited for use on fabric filter type dust collectors (baghouses). It provides reliable and robust monitoring of particulate dust levels and leaks from faulty bag media. The sensor, installed ...
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Envea - Model Leak Alert 80 - Electro Dynamic Filter Dust Leak Monitor
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Envea - Model Leak Alert 80 - Electro Dynamic Filter Dust Leak Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Stand alone TÜV approved filter dust monitor suited to the measurement of filter emissions after bag houses, cartridge filters, cyclones ...
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Envea - Model View 820 - Electro Dynamic Dust Monitor
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Envea - Model View 820 - Electro Dynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Certified Multi-sensor dust monitor – category 1 under ATEX / IECEx – for indicative emissions trending and measurement in hazardous zone and in dry processess with elevated pressures. Advanced Probe Electrification featuring long term data logging for process trend analysis and ...
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ENVEA - Model VIEW 580 - Dynamic Opacity Dust Monitor
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ENVEA - Model VIEW 580 - Dynamic Opacity Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Stand alone Cross Stack optical dust monitor suitable for measuring emissions after electrostatic precipitators and stacks without filtration systems. Used for emissions measurement (mg/m³) after electrostatic precipitators and baghouses or Process control applications. Advanced sensor design includes automatic drift (zero and span) ...
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ENVEA - Model VIEW 273 - ElectroDynamic Dust Monitor
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ENVEA - Model VIEW 273 - ElectroDynamic Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-sensor dust monitor for indicative emissions trending in industrial stacks after bag filters, cartridge filters, cyclones and process driers, where regulatory approvals are not necessary. Advanced Probe Electrification featuring long term data logging for process trend analysis and ...
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ENVEA - Model STACK 602 - Dynamic opacity Approved Particulate CEM
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ENVEA - Model STACK 602 - Dynamic opacity Approved Particulate CEM

Manufactured by:ENVEA   based inPoissy, FRANCE
TÜV approved DynamicOpacity™ particulate monitor for emission measurement of dust from large dry industrial processes including Baghouses and Electrostatic ...
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Envea - Model View 800 - Electro Dynamic Multi-Sensor Dust Monitor
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Envea - Model View 800 - Electro Dynamic Multi-Sensor Dust Monitor

Manufactured by:ENVEA   based inPoissy, FRANCE
Multi-Sensor Dust Monitor certified to category 1 under ATEX / IECEx designed for indicative emissions trending and measurement in challenging hazardous zone. Advanced Probe Electrification technology, perfectly adapted for particulate monitoring after bag filters, cartridge filters, cyclones and process driers, where regulatory approvals are not ...
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